Sims Characterisation of ZnO Layer Prepared By Pulsed Laser Deposition
Andrej Vincze, Miroslav Michalka, Jaroslav Bruncko, Frantisek Uherek
DOI:
Abstract
New material development requires new technologies to create and prepare basic material for semiconductor industry and device applications. Materials have given properties, which exhibit particulary small tolerances. One of the most important and promising material is recently ZnO. ZnO has specific properties for near UV emission and absorption optical devices. The pulsed laser deposition (PLD) is one of the methods to prepare this type ofmaterial. The aim of this paper is to compare properties of ZnO layers deposited from pure Zn target in oxygen atmosphere and the analysis of their surface properties by secondary ion mass spectroscopy (SIMS), atomic force microscopy (AFM) and scanning electron microscopy (SEM).